Large-scale (4-inch) plasma etching technology for mass production of next-generation two-dimensional semiconductors has been developed for the first time in the world

Newswise — A large-scale (4-inch), highly uniform, and defect-free plasma etching technology, which will likely become the foundation of the industrial supply of molybdenum disulfide (MoS₂), a next-generation…

Read more Large-scale (4-inch) plasma etching technology for mass production of next-generation two-dimensional semiconductors has been developed for the first time in the world